Hudpleje-pausen: rens og creme

• SKIN1004 Madagascar Centella Ampoule Foam, 125 ml (119 kr.)
• Dr. Althea 345 Relief Cream, 50 ml (209 kr.)

1. Skum en lille mængde rens op med vand, massér blidt over ansigtet og skyl af med lunkent vand.
2. Påfør cremen på ansigt og hals som sidste trin.

Brug morgen og aften eller efter behov.

Normal, tør, kombineret og sensitiv hud.

Begge produkter er fri for tilsat parfume og ethanol (alkohol). Rensen er desuden fri for æteriske olier og silikone.

SKIN1004 Madagascar Centella Ampoule Foam: Water, Sodium Cocoyl Isethionate, Glycerin, Sodium Methyl Cocoyl Taurate, Coco-Betaine, Centella Asiatica Extract, Potassium Cocoyl Glycinate, 1,2-Hexanediol, Potassium Cocoate, Potassium Benzoate, Polyquaternium-67, Citric Acid, Sodium Chloride, Butylene Glycol, Dextrin, Theobroma Cacao Extract, Disodium EDTA, Sodium Acetate, Sodium Bicarbonate, Coptis Chinensis Root Extract, Sodium Hyaluronate, Coccinia Indica Fruit Extract, Eclipta Prostrata Extract.

Dr. Althea 345 Relief Cream: Water, Melaleuca Alternifolia Leaf Water, Propanediol, Glycerin, 1,2-Hexanediol, Hydrogenated Polydecene, Vinyldimethicone, C14-22 Alcohols, Niacinamide, Caprylic/Capric Triglyceride, Panthenol, Dicaprylyl Carbonate, Butylene Glycol, Ammonium Acryloyldimethyltaurate/VP Copolymer, Caprylyl Methicone, Polymethylsilsesquioxane, C12-20 Alkyl Glucoside, Hydroxyacetophenone, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Polyquaternium-51, Ethylhexylglycerin, Tromethamine, Sodium Hyaluronate, Sodium Stearoyl Glutamate, Coptis Japonica Root Extract, Centella Asiatica Leaf Water, Beta-Glucan, Resveratrol, Hydrolyzed Hyaluronic Acid, Camellia Sinensis Leaf Water, Tocopherol, Madecassoside, Sodium DNA, Centella Asiatica Extract, Ceramide NP, Tannic Acid, Disodium EDTA, Sodium Phytate.

Producenterne kan opdatere ingredienslisterne. Se altid emballagen for den gældende liste.